Abstract

We report the development of two epilayers namely the baseline highly strained channel and enhanced low gate leakage samples. The Hall data shows that the enhanced epilayer portraying higher sheet carrier concentration, but comparable carrier mobility in the 2-DEG layer, as compared to the baseline sample. The WinGreen simulation also conformed the enhanced epilayer advantages where wider Schottky barrier is observed and subsequently double carrier concentration is simulated in the channel. Both samples show low AuGe/Au Ohmic contact resistivity of approximately 0.16 Ω.mm. A tremendous advantage on 1 μm Schottky gate leakage is also recorded on enhanced epilayer where the leakage is more than seven times lower than that of the baseline sample. The resulted characteristics are much better than the reported submicron device, thus this device has find an important application in high-gain lossless transmission, especially in underwater optical communication system.

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