Abstract

We performed slip tests using 300 mm diameter wafers on an inner three-point symmetrical boat in a batch-type vertical furnace. The maximum temperatures necessary to avoid a slip are shown for low-oxygen content and heavily boron-doped wafers. After studying the dependence of slip extension on wafer-annealing time at temperatures above 1100°C, we discuss the influence of bending stress on slip extension. It is emphasized that inner three-point symmetrical support has an advantage that the resolved shear component of thermal stress is considerably lower than that in the peripheral support as well as that of bending stress is.

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