Abstract
Nanocrystalline titanium films were prepared by d.c. magnetron sputtering and evaporation on copper foil substrates cooled down to liquid N 2 temperature. The results of X-ray diffraction as well as transmission electron microscopy show that the titanium films consist of nanocrystalline particles with 5–15 nm grain size. However, the films deposited by the two different methods are of different crystalline structures. The evaporated films have the normal h.c.p. structure, while the sputtered titanium films have an abnormal b.c.c. structure with the same lattice parameter as the β phase of titanium at high temperature (more than 882 °C). The lattice parameter of the sputtered film was determined as 0.331 78 nm, which is close to that of the β phase measured using Ta-Ti alloy. The mechanism of the film formation process is discussed.
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