Abstract
The use of beam interference in combination with a large-area photoconductive emitter for the generation of pulsed terahertz (THz) radiation is presented. An interference pattern with a period twice that of the THz emitter is generated with a transmission phase grating, placed directly in front of the photoconductive emitter. This way, efficient THz generation is achieved with a single metallisation layer and a single lithography step in the fabrication technology of the THz emitter.
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