Abstract
Focused electron and ion beam-induced deposition (FEBID/FIBID) are direct-write techniques with particular advantages in three-dimensional (3D) fabrication of ferromagnetic or superconducting nanostructures. Recently, two novel precursors, HCoFe(CO) and Nb(NMe)(N-t-Bu), were introduced, resulting in fully metallic CoFe ferromagnetic alloys by FEBID and superconducting NbC by FIBID, respectively. In order to properly define the writing strategy for the fabrication of 3D structures using these precursors, their temperature-dependent average residence time on the substrate and growing deposit needs to be known. This is a prerequisite for employing the simulation-guided 3D computer aided design (CAD) approach to FEBID/FIBID, which was introduced recently. We fabricated a series of rectangular-shaped deposits by FEBID at different substrate temperatures between 5 C and 24 C using the precursors and extracted the activation energy for precursor desorption and the pre-exponential factor from the measured heights of the deposits using the continuum growth model of FEBID based on the reaction-diffusion equation for the adsorbed precursor.
Highlights
Direct-write nano-fabrication by focused electron and ion beam-induced deposition (FEBID/FIBID) has become one of the most promising approaches for the realization of two- and three-dimensional (3D) functional structures with particular relevance for the fields of nano-magnetism [1,2,3,4], nano-optics [5,6], and superconductivity of nanostructures [7,8]. This is due to essentially two important advantages that FEBID/FIBID have as compared to other technologies [9], which are their applicability on virtually any surface and the flexibility to fabricate wireframe- [3] as well as sheet-like [10] structures with sub-100 nm resolution
Over the last few years, this has led to the evolution of a simulation-guided 3D computer aided design (CAD) approach which was pioneered by Fowlkes and collaborators [11] and has been further developed towards a reliable instrument for 3D nano-fabrication even of complex nano-architectures, as was recently reviewed by Winkler et al [12]
With a view to the simulation-guided 3D CAD approach to nano-fabrication which uses the continuum model of FEBID/FIBID growth, a set of simulation parameters is required; see Reference [15]
Summary
Direct-write nano-fabrication by focused electron and ion beam-induced deposition (FEBID/FIBID) has become one of the most promising approaches for the realization of two- and three-dimensional (3D) functional structures with particular relevance for the fields of nano-magnetism [1,2,3,4], nano-optics [5,6], and superconductivity of nanostructures [7,8]. This is due to essentially two important advantages that FEBID/FIBID have as compared to other technologies [9], which are their applicability on virtually any surface and the flexibility to fabricate wireframe- [3] as well as sheet-like [10] structures with sub-100 nm resolution. With a view to the simulation-guided 3D CAD approach to nano-fabrication which uses the continuum model of FEBID/FIBID growth, a set of simulation parameters is required; see Reference [15]
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