Abstract

Volatile resistive switching random access memory (RRAM) devices are drawing attention in both storage and computing applications due to their high ON-/ OFF-ratio, fast switching speed, low leakage, and scalability. However, these devices are relatively new and the physical switching mechanisms are still under investigation. A thorough understanding and modeling of the physical dynamics underlying filament formation and self-dissolution are of utmost importance in view of future integration of volatile devices in neuromorphic systems and in memory arrays. To assess the physical mechanisms and develop appropriate models, though, the electrical properties of the device have to be characterized. In this article, we present an extensive study of Ag/SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</sub> -based volatile RRAM devices. Important parameters, such as switching time, switching voltage, and retention time are investigated as a function of the stimulation conditions. A physical explanation is provided and the applicability of the device in neuromorphic systems is discussed.

Highlights

  • T HE fast increase of applications and devices which need to adapt and interact with the environment calls for a radical change of present computing paradigms [1], [2]

  • We provide an extensive study of the electrical behavior of Ag/SiOx-based volatile resistive switching random access memory (RRAM) devices

  • We investigate the dependence of switching time and retention time on voltage amplitude, pulse time width, and current compliance

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Summary

Introduction

T HE fast increase of applications and devices which need to adapt and interact with the environment calls for a radical change of present computing paradigms [1], [2].

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