Abstract
The morphology and structure of 3C-SiC(001) surfaces, grown on Si(001) and prepared via hydrogen etching, are studied using atomic force microscopy (AFM), low-energy electron diffraction (LEED), and Auger electron spectroscopy (AES). On the etched samples, flat surfaces with large terraces and atomic steps are revealed by AFM. In ultrahigh vacuum a sharp LEED pattern with an approximate (5×1) periodicity is observed. AES studies reveal a “bulklike” composition up to the near surface region and indicate that an overlayer consisting of a weakly bound silicon oxide monolayer is present.
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