Abstract
Boron nitride (BN) and boron carbon nitride (BCN) films with various carbon (C) composition ratios are synthesized by plasma-assisted chemical vapor deposition (PACVD). BN and BCN films are treated with nitrogen (N 2) or hydrogen (H 2) plasma. The electron affinity of the BCN film is estimated from the threshold energy of the photoelectron yield and the bandgap energy. Negative electron affinity (NEA) is observed for the BN film treated with H 2 plasma and N 2 plasma. On the contrary, positive electron affinity is observed for the BCN films. It is found that a reduction in the electron affinity occurs due to N 2 plasma treatment rather than H 2 plasma treatment for the BCN films. Field emission characteristics of the BCN nanofilms treated with plasma are investigated. The turn-on electric field of the electron emission characteristics from the BCN film treated with N 2 plasma is lower than that treated with H 2 plasma. This result is related to the behavior of the electron affinity of the BCN film.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
