Abstract
Synthesis of boron nitride (BN) and boron carbon nitride (BCN) films is carried out by plasma-assisted chemical vapor deposition. The electron affinity of the BN and BCN films is estimated from the threshold energy of the photoelectron yield and the bandgap energy. The negative electron affinity appears on the BN surface, while the positive electron affinity increases on the BCN surface with increasing C composition ratio. It is found that a reduction in the electron affinity occurs due to N 2 plasma treatment rather than H 2 plasma treatment for the BCN film. Field emission characteristics of the BN and BCN nanofilms are investigated. The turn-on electric field of the electron emission does not increase in the region of the C composition ratio lower than 20 %. This is due to the effects of increasing electron affinity and decreasing conduction band discontinuity between the BCN nanofilm and Si substrate. It is demonstrated that field emission characteristics of the graphite nanofiber are improved significantly by coating with BN nanofilm.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
