Study on structural, morphological, optical, and luminescence properties of nickel oxide thin-film synthesized by dip-coating technique

Abstract

Nickel oxide is one of the best materials for fabricating optical devices. The Dip-coating technique was used to deposit nickel oxide thin films on a glass substrate. Nickel acetate tetrahydrate Ni (Ac) 2·H2O was used as starting precursor and monoethanolamine (MEA) was added as a catalyst. These fabricated films were pre-heated at 150 °C for 10 min and then annealed in the air at 400–700 °C temperatures. XRD, UV–Vis-NIR, FESEM, EDAX, and photoluminescence techniques are used for analyzing the fabricated films. FESEM and EDAX studies confirmed the surface and the elemental analysis of the prepared films. X-ray diffraction studies confirmed the structure of the Nickel oxide film. The UV–Vis-NIR spectrometer was used to analyze the transmission and absorption spectra of the films.