Study on HfO 2 /SiO 2 high reflective film damage induced by 248nm UV excimer laser

Abstract

The deep ultraviolet optical thin films play an important role in excimer lasers, deep ultraviolet lithography machine and other laser systems. In this paper, the experiment on damage in HfO2/ SiO2 high reflective film irradiated by 248nm ultraviolet excimer laser was carried out. And the high reflection film is coated with a layer of SiO2 as a protective film. The damage morphology and depth of the samples were observed and analyzed by means of DIC microscope and surface profiler system. In this experiment, the laser-induced damage threshold of HfO2/ SiO2 high reflective film coated with SiO2 protective film was calculated by zero damage probability. Based on the surface characteristics of the damage points, we established the model to analyze the damage mechanism of the high reflectance film by using Finite Element Method(FEM). The experimental results show that the damage threshold of 248nm excimer laser to the highly reflective film is 3.086J/cm2. When the incident laser energy is 3.33J/cm2, stress damage appears on the surface of the highly reflective film. With the increase of laser energy, the high reflective film will appear melting damage and corrugated damage.