The photo-thermal absorbing influence on introducing laser-damaging of the fused silica

Abstract

The fused silica play a key role among the High laser power device as the laser-transmitter. Many factor induced the damaging, such as the surface topography, the defect (bubbles, particulates), the doped-elements which can absorbing the laser-energy. Among them, the absorption of the specific wavelength laser can lead to the heating up which provide the motive power for the Silica tetrahedron Lattice disintegration. We did research on the absorption of the specific wavelength laser to find the relationship among the manufacturing process, the structure of the fused silica and the Laser damage threshold. From the research, there is rarely any relationship between the extent of the absorption of the specific wavelength laser and the OH. While the purity is the key factor.Although the Impure substance will lead to weak absorption, the LIDT of the 1064nm is beyond 100J/cm2.