Abstract

The MOVPE overgrowth of high [0 1¯ 1]-oriented ridges confined at sides by facets related to { n 1 1} crystallographic planes is reported. We studied the influence of the side tilt on the thickness of the AlGaAs and GaAs epitaxial layers grown under the condition of the kinetic growth mode. The multi quantum well (MQW) structures were prepared on the sides of ridges tilted at 54.7°, 45° and 30° to (1 0 0). The sidewall surface morphologies before and after epitaxial growth were evaluated and compared. We observed no tendency towards planarization towards a neighbouring high-index crystallographic plane, such as (2 1 1) and (3 1 1). We also showed that the quantum wells of the MQW structure make a smooth transition over the edge between the top surface and the facet as both AlGaAs and GaAs grew at similar rates on the surfaces.

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