Study of growth and doping of semiconductor films by the method of computer simulation

Abstract

AbstractThe possibility of Computer Simulation Monte‐Carlo Method for the study of growth and doping regularities of semiconductor films with diamond type lattice and for control of their parameters is considered. The events probabilities of isolation attachment and diffusion displacements of atoms on the growing surface of the basic material and doping impurities are compared. The periodic regional conditions on the boundary of the considered area are presented. It is shown the limitations of the computer simulation methods because of growth processes knowing level and computer possibility. The modeling calculations are made for growth and doping of one‐component material films and for growth of two‐component compounds. It can be noticed the connection between supersaturation, deposition temperature, time growth rate, surface film roughness (impurity atoms), capture coefficient, doping level, critical thickness of continuous films, defects density. Computer experimental results are compared with experimental data on growth and doping of Si, Ge, GaAs film with the various orientations from vapour or molecular beams in vacuum. The ways of further development of computer simulation method are discussed.