Abstract
In this work, a charge pumping characterization has been carried out on 4H-SiC nMOSFETs built with different SiC doping processes. Because charge pumping (CP) measurements on SiC are complex to implement, three different CP methods have been used for Dit characterization. The impact of geometrical and electrical parameters on each method is studied. Finally, it is detailed the full measurement flow chosen for a deeper and more accurate understanding of Dit electrical characterization.
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