Abstract
Effects of Ar addition are studied by using a beam injection type negative ion source. With adding Ar, I H − increases at low base H 2 pressure. At high base H 2 pressure, however, I H − decreases. VUV emission intensities also decrease at high base pressure. In other words, Ar addition is adverse effect for production of H 2 (v″). Therefore, decrease in I H − is caused by decrease in H 2 ( v″). In D 2 plasmas, variation patterns of plasma parameters and VUV intensities by Ar addition are nearly the same as ones in H 2 plasmas. Even in low base pressure, however, enhancement of I D − is not observed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
