Abstract
The combination of X-ray reflectivity and grazing incidence X-ray fluorescence has been applied to the characterization of an In2O3/Ag/In2O3 stack for advanced photovoltaic applications. X-ray reflectivity is a well-known method for the characterization of multilayered structures by providing information on the thickness and the in-depth electronic density. Grazing incidence X-ray fluorescence provides information about the elemental depth distribution. As these techniques are based on similar measurement procedures and data evaluation approaches, their combination reduces the uncertainties of the individual techniques and provides an accurate depth-resolving analysis of multi-layers.It has been shown that the combination of the techniques give insight into the material composition and the layers structure (thickness, density) as well as modifications induced by a thermal annealing.As X-ray fluorescence signals have been acquired at different excitation energies, the influence of this parameter on the sensitivity of the measurements to the structural properties has been shown.
Highlights
Transparent and conductive oxide (TCO) layers are essential components in several emerging photosensitive electronic products
The structure of the samples studied by combined X-ray reflectivity (XRR)-grazing incidence X-ray fluorescence (GIXRF) analysis consists in a 6 nm Ag layer embedded between two 40 nm In2O3 layers deposited on a 500 mm SiO2 /Si(001) substrate
Thanks to the decoupling of the sample parameters, the determination of the electronic density is reinforced by the use of the XRR and GIXRF curves for a joint fit
Summary
Transparent and conductive oxide (TCO) layers are essential components in several emerging photosensitive electronic products. Metaloxides such as SnO2, In2O3, or ZnO have widely been used acting as transparent electrical contacts or electrodes in flat panel displays, touch screens, and thin film solar cells [1,2]. There is a wide range of requirements for these layers depending on the application. Resistivity needs to be tailored to meet the electrical functionality. The sheet resistance (Rs) must be in the 8-80 Ω/sq range [3]. The other key factor is the optical transmission (T) of the layers. The material must be transparent in the visible spectral range
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