Abstract
Ternary Zr–Cu–Ti system, especial with a high Ti content, is normally difficult to be fully vitrified. In this paper, we demonstrate that cosputtering can produce amorphous Zr–Cu–Ti thin films with an excessive Ti content even as high as 19%. Sub-Tg annealing of the film induces the formation of medium-range-ordered clusters and to raise the nanohardness by 35% to 6.6GPa. The promising mechanical properties of the sub-Tg annealed Zr52Cu29Ti19 films offer great potential for microelectromechanical system applications.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
