Abstract
The present work concerns the electrochemical deposition of aluminium doped ZnO nanostructured thin films on SnO2:F covered glass substrates. Doped with Al nanostructured ZnO (ZnO:Al) films are obtained by an electrochemical process using a three-electrode potentiostatic system with a saturated calomel electrode as reference electrode, in aqueous solution containing ZnCl2, KCl and Al2(SO4)3. The influence of the deposition parameters on the structural properties of the obtained ZnO:Al layers is investigated by Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD) and Atomic Force Microscopy (AFM). Energy Dispersive X-ray Analysis (EDAX) is applied for measurement of the Al content in the films. The SEM micrographs and AFM pictures show that the ZnO:Al films consist of nanograins with a shape of walls. The XRD spectra demonstrate (100), (002), (101), (110) and (103) the characteristic reflexes of the ZnO. Influence of the Al concentration on the IR reflectance spectra and haze ratio of ZnO:Al thin films are presented and discussed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
