Abstract
We proposed an efficient method for improving the stitching precision of large-area microstructures. A clever triangular region compensation strategy based on a digital micromirror device oblique scanning exposure mode was developed, which can effectively enhance lithographic resolution and complete seamless stitching. In order to ensure the optimal stitching effect, the stage self-calibration technology was also introduced into the exposure system. The experimental results showed that the stitching region traces can be effectively eliminated and smoothed by the above strategy. The presented method will have important applications in the printed circuit board and flat panel display fields.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
