Statistical Timing Analysis Considering Device and Interconnect Variability for BEOL Requirements in the 5-nm Node and Beyond

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In an increasing interconnect resistance era and aggressive metal pitch scaling, the elevating RC delay could significantly shadow the improvements from advanced device architectures and become a severe design issue. This paper will holistically analyze the interplay between transistors and interconnect delay and the variability induced by back-end-ofline (BEOL) process for the 5-nm node. A global sensitivity analysis using Monte Carlo simulation is employed as a powerful tool for understanding the significance of different variation sources and propagating these process uncertainties to circuit performance and parametric yield. For the BEOL integration process, our results show that dielectric κ-value is the most sensitive parameter. Regarding the patterning options, the BEOL process using self-aligned quadruple pattering with positive tone process requires more than a 4× process margin and suffers from 50% parametric yield loss. The required guardband for lithoetch litho-etch becomes as critical as for the self-aligned double patterning process when the overlay control is 6× higher than the critical dimension control. For trench patterning using spacerdefined techniques, a negative tone process is required to achieve a large process window. From a design perspective, the wire length in SoC can be optimized using a disruptive architecture as a vertical FET, which could potentially reduce the average wire length by 11%.