Abstract
Static Vapor Pressure Measurement of Low Volatility Precursors for Molecular Vapor Deposition Below Ambient Temperature
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https://doi.org/10.1002/1521-3862(200101)7:1<33::aid-cvde33>3.3.co;2-p
Journal: Chemical Vapor Deposition | Publication Date: Jan 1, 2001 |
Citations: 1 |
Static Vapor Pressure Measurement of Low Volatility Precursors for Molecular Vapor Deposition Below Ambient Temperature
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