Abstract
In this study, we present a process to deposit cadmium sulfide (CdS) thin film on glass substrate using in-house made CdS sputter target deposited by RF (radio frequency) magnetron sputtering. The bandgap of CdS film was about 2.4 eV estimated using tauc plot. Structural analysis was done using XRD and highest peak is at (101) and two other small peaks at (100) and (110) confirm CdS phase. Raman analysis was done for further confirmation of phases present in CdS film where peaks at 299.97 cm-1 and 599.8 cm-1 showed phase pure CdS film. The sputtering method used for CdS thin film preparation is an industrially viable technique and can be used for in line mass production.
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