Abstract

We have grown low-resistive and n-type β-FeSi 2 single crystals by the temperature gradient solution growth (TGSG) method using Ni-doped Zn solvent. These crystals were obtained at the Ni concentrations between 0.05 and 0.5 wt%. Above the Ni concentration of 1.0 wt%, nickel silicides were preferably grown. The resisitivity of the Ni-doped crystals was 0.2–0.5 Ω cm at room temperature (RT). The electron concentration and Hall mobility at RT were (5–6)×10 18 cm −3 and 3–6 cm 2/V s, respectively. We also determined the ionization energy of 26–60 meV for the Ni impurity in β-FeSi 2.

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