Simulation insights of a new dual gate graphene nano-ribbon tunnel field-effect transistors for THz applications

Abstract

This paper introduces a dual gate Graphene Nano-Ribbon Tunnel Field Effect Transistor (DG GNR TFET) structure and its performance characteristics are analysed. Technology Computer-Aided Design (TCAD) tool is used to simulate this novel non-silicon GNR TFET and to characterize various parameters of the device. A DG GNR TFET shows better device performance in terms of its surface potential, electric field and ON current (ION). The simulation results show that the proposed structure exhibits better ION/IOFF (109), average sub-threshold swing (43.16 mv/Dec) and threshold (0.3 V) when compared to a conventional Silicon TFET. Design parameters for the device such as dielectric thickness, body thickness, work function, source doping concentration, and channel length are analysed to deduce the fact that GNR can be used as an effective material in TFETs for low power electronics applications. Moreover, key parameters such as transconductance, transconductance generation efficiency and cut-off frequency (THz) are greatly improved in this proposed structure, which is highly desirable for analog/RF applications.