Abstract

Grids fabricated by anisotropically etching (110) silicon havebeen investigated for use in extracting and accelerating ions throughtheir apertures. The silicon grids provide stable ion beams, resulting ina life span that is five times that of conventional stainless-steel gridsof the same grid thickness, and large thickness for the same open areas.The silicon grids also have a big advantage because they do not experiencethe substantial plastic deformation that stainless-steel grids do. Inaddition, they provide a density of ions a few times higher thanconventional carbon grids, although their life span is shorter. Moreover,they can protect samples from being contaminated by impurities such asheavy metals contained in stainless steel. Therefore, silicon grids aresuitable for fabricating optical elements, such as microlenses and opticalfilms in optical microelectromechanical systems.

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