Abstract
Glass substrates modified with 3‐mercaptopropyltrimethoxysilane (MPS) were used to deposit CdS thin films in the process of successive ionic layer adsorption and reaction (SILAR). The films were characterized by X‐ray diffraction, optical absorption, and atomic force microscopy (AFM). AFM showed that the modified substrates were in favor of the growth of the films by comparison with the unmodified ones. The depositing rate of the films was faster on modified substrates than on unmodified ones.
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