Abstract
Two issues ago TFR turned its attention to the use of epitaxy for the production of silicon-germanium (SiGe) devices. Since then there have been some very important further developments. These include the commercial launch of the first of the next-generation of production CVD systems for SiGe from Thermo VG Semicon, the EpiStar CV200. The SiGe CVD market was until recently split between ASM, Unaxis and Applied Materials. These are principally silicon equipment manufacturers but Unaxis will be familiar to readers of this magazine for its III–V etch and deposition equipment. However, the newest entrants to the field will be very familiar from their III–V epitaxy systems.
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