Abstract

Silicene has attracted remarkable attention in the semiconductor research community due to its silicon (Si) nature. It is predicted as one of the most promising candidates for the next generation nanoelectronic devices. In this paper, an efficient non-iterative technique is employed to create the SPICE models for p-type and n-type uniformly doped silicene field-effect transistors (FETs). The current-voltage characteristics show that the proposed silicene FET models exhibit high on-to-off current ratio under ballistic transport. In order to obtain practical digital logic timing diagrams, a parasitic load capacitance, which is dependent on the interconnect length, is attached at the output terminal of the logic circuits. Furthermore, the key circuit performance metrics, including the propagation delay, average power, power-delay product and energy-delay product of the proposed silicene-based logic gates are extracted and benchmarked with published results. The effects of the interconnect length to the propagation delay and average power are also investigated. The results of this work further envisage the uniformly doped silicene as a promising candidate for future nanoelectronic applications.

Highlights

  • Digital logic gates are the foundation of modern computation and information processing in various systems such as nanostructure computers [1,2], photonic technology [3,4] and biomedical engineering [5,6]

  • We propose to employ the n-type and p-type uniformly doped silicene as the semiconducting channel of the silicene-based field-effect transistors (FETs), by using phosphorus (P) and aluminium (Al) as the dopant atoms, respectively

  • Previous work [33] shows only the modelling procedures for the p-type AlSi3 nanosheet, the same technique is repeated to compute the electronic properties of n-type p-type (AlSi3) and n-type (PSi3) nanosheet, in order to obtain both type of transistors for complementary metal–oxide–semiconductor (CMOS) applications

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Summary

Introduction

Digital logic gates are the foundation of modern computation and information processing in various systems such as nanostructure computers [1,2], photonic technology [3,4] and biomedical engineering [5,6]. Altering nanoribbon width is proven to be an viable bandgap engineering option, the fabrication technique to produce nanoribbon with perfect edge control is yet to be discovered, even for the well-known and matured graphene [26] Due to this shortcoming, we propose to employ the n-type and p-type uniformly doped silicene as the semiconducting channel of the silicene-based FETs, by using phosphorus (P) and aluminium (Al) as the dopant atoms, respectively. The circuit-level performance of n-type and p-type uniformly doped silicene FETs, as shown, are assessed by developing a SPICE-compatible model [32].

Uniformly doped silicene transistors
Device and circuit simulation
Timing diagrams
Performance analysis of digital logic circuits
Conclusions
Full Text
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