Abstract
One-dimensional ZnO nanodot arrays have been realized by metalorganic chemical vapor deposition on SiO2 substrates patterned by focused ion beam (FIB). Especially for the lines with the depth of 5 nm and the length of 0.7, 1.3 or 1.7 µm, one, two or three nanodots, respectively, of fairly uniform size 6-nm height and 80-nm width are symmetrically accommodated in a line. These phenomena are translated as “self-tailoring” of ZnO nanodots, i.e., where the nanodots will be is predetermined before the growth and is arbitrarily controlled by the nanopatterns. This can be a promising technique to build nanostructure blocks for nanoscale device applications.
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