Abstract
Highly ordered one- and two-dimensional ZnO nanodot arrays were realized by self-ordering on focused ion beam (FIB)-functionalised SiO2/Si substrates. Metalorganic chemical vapor deposition was used to deposit zero-dimensional ZnO nanostructures on nanopatterns acting as artificial traps for Zn adatoms. The quality of the multidimensional nanodot arrays depends on the FIB-introduced nanopattern morphologies and MOCVD growth conditions. Energy-dispersive X-ray measurements showed that Ga atoms incorporated in patterned areas during FIB-engraving play an important role for the initial nucleation of ZnO nanodots. (© 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
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