Abstract
We demonstrate a selective deposition of ultrathin gold layers via CVD onto self-assembled dithiols. Dithiols have been self-assembled to produce a thiolated surface. Metallic gold was deposited from the gas phase by using a volatile organometallic molecular gold precursor. The gold layer is bound to the exposed thiol groups. We demonstrate a selective deposition of the gold only at the areas where the binding thiol groups are located and characterized the deposition process and the obtained coatings with spontaneous desorption time of flight mass spectrometry and Rutherford backscattering spectroscopy.
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