Fabrication of in situ Patterned Iron Oxide Films using Micro Contact Printing and Selective Deposition

Abstract

In situ patterning of iron oxide thin layers were fabricated via microcontact printing (μCP) and selective area deposition. μCP is used to pattern two different surface moieties of self-assembled organic monolayers (SAMs) on Au/Cr/Si substrates. An elastomeric stamp is used to transfer hydrophobic (hexadecanethiol (HDT)) SAMs that are to sustain deposition of iron oxide precipitates. Hydrophilic (dithiothreitol, DTT) SAMs were used to induce crystalline iron oxide films. 0.05 M of iron nitrate (Fe(NO3)3·9H2O) aqueous solutions containing urea under nitric acid (pH ≤ 2) were used. Selective depositions were realized through precipitation of crystalline iron oxides at ambient temperature (80°C) onto the mixed SAM surfaces.