Abstract
Deoxyribonucleic acid (DNA) molecules can be selectively adsorbed onto a SiO2 surface in SiO2/SiH pattern, fabricated using photolithography, by adding MgCl2 to a DNA solution. Since DNA molecules can be adsorbed onto a Si substrate through Mg2+, the adsorption of DNA molecules in a SiO2/SiH pattern is influenced by the concentration of MgCl2 and the difference in chemical property between a SiO2 surface and a SiH surface. The optimum concentration of MgCl2 at which DNA molecules are selectively adsorbed onto a SiO2 surface was 0.1 mM.
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