Abstract
We performed a theoretical investigation on the interaction of dopant atoms with extended defects in semiconductors using ab initio total energy calculations. Dopant atoms (donors and acceptors) were found to segregate in stacking faults in silicon and in gallium arsenide, with segregation energies as large as 0.2 eV. A general trend on the electronic properties of segregated dopants in stacking faults is that the donor (or acceptor) electronic energy levels become deeper in the electronic gap, as compared to those levels for the defect in a crystalline site.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
