Research of ion feedback-induced noise of micro-channel plate

Abstract

Rb+, Cs+ and other alkali metal ions in the Micro-channel Plate（MCP）channel, under the action of an electric field, leave out of the channel wall of MCP, and accelerate to input surface of channel along the opposite direction of the electric field to form ion feedback-induced noise. The feedback ions will cause great harms, it will bombard the cathode surface, resulting in decreased cathode sensitivity, reducing tube life, so you must take measures to reduce ion feedback-induced noise. This paper analyzes how to reduce ion feedback-induced noise from five aspects of the MCP materials, etching, annealing in hydrogen, high-temperature baking and electron scrubbing. Through the utilization of mixed alkali effect of suppressing mutual diffusion and decreasing internal network cavity to improve structure of MCP glass wall, the diffusion coefficient of each ion is reduced; the content of Al2O3 is reduced to reduce the Na+, K+ diffusion losses; etching process is optimized, except for the acid corrosion, the alkali corrosion, special acid etching and vacuum baking process are used; annealing in hydrogen technology is also optimized, the time of annealing in hydrogen was chosen on 270 ~ 350 minutes; and the vacuum baking and electron scrubbing are handled before manufacturing. By the above methods the ion feedback-induced noise is reduced.