Relationship between Control of Reactive Plasmas with Magnetic Filter and Formation of Thin Films

Abstract

Plasma parameters (CH4/H2+Ar plasmas) are spatially well controlled using a movable magnetic filter. At any filter position, plasma parameters change dramatically across the magnetic filter. The plasma is divided into two parts, the source plasma region (high density plasmas with energetic electrons) and the diffused plasma region (low electron-temperature plasmas without energetic electrons). Carbon thin films are prepared well in the diffused plasma region. The effects of bias potential of the substrate and control of neutral radicals on formation of thin films are discussed briefly.