Relationship between channel mobility and interface state density in SiC metal–oxide–semiconductor field-effect transistor

Abstract

Temperature dependence of threshold voltage in n-channel SiC metal–oxide–semiconductor field-effect transistors (MOSFETs) was studied. Linear relation was observed between the threshold voltage shift when the temperature varies from −150 to 150 °C and the number of the interface states present within the energy range of 0.2–0.4 eV from the conduction band edge energy Ec. This relationship revealed that the interface state profile near Ec in n-channel SiC MOSFETs can be represented by that in n-type SiC MOS capacitors. The relationship between the channel mobility and the interface state profile also suggested that the interface states within the energy range of 0.2–0.4 eV from Ec have little influence on the channel mobility.