Abstract
This work studies a nanoporous silicon (Si) substrate prepared by metal-assisted nanoscale lithography. Au nanoparticles (GNPs) and poly(3-hexylthiophene) (P3HT) were deposited on the nanoporous Si substrate using the ultrasonic spraying and the spin coating, respectively. The total integrated total reflectances from the nanoporous Si substrate formed by using HF/H2O2/AgNO3 solution for 60-s etching is around lower than 0.85% over the whole visible and near infrared wavelengths. The total integrated reflectance from the nanoporous Si substrate with GNPs and P3HT coating are, respectively, around 0.75 and 2.3% over the whole visible and near infrared wavelengths.
Published Version
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