Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser

F Brizuela,C Brewer,J A Liddle,G Vaschenko,W Chao,D T Attwood,I A Artioukov,M Grisham,E H Anderson,Y P Pershyn,J J Rocca,M C Marconi,C S Menoni,A V Vinogradov,V V Kondratenko

doi:10.1364/opex.13.003983

Abstract

We report the demonstration of reflection mode imaging of 100 nm-scale features using 46.9 nm light from a compact capillary-discharge laser. Our imaging system employs a Sc/Si multilayer coated Schwarzschild condenser and a freestanding zone plate objective. The reported results advance the development of practical and readily available surface and nanostructure imaging tools based on the use of compact sources of extreme ultraviolet light.

Highlights

As nanotechnology rapidly advances, compact and practical tools capable of imaging at nanometer scales are of growing interest
We report the demonstration of reflection mode imaging of 100 nm-scale features using 46.9 nm light from a compact capillary-discharge laser
The reported results advance the development of practical and readily available surface and nanostructure imaging tools based on the use of compact sources of extreme ultraviolet light

Summary

Introduction

Compact and practical tools capable of imaging at nanometer scales are of growing interest. Compared to electron and scanning tip microcopies, optical microscopy is advantageous in that the sample requires little preparation, images are rapidly rendered and the sample’s environment can be varied (e.g. exposed to an electromagnetic field). The resolution of conventional optical microscopes is limited by the wavelength of the illuminating source. To overcome this limitation several methods based on nonlinear optical effects, interference, and surface techniques, that improve the resolution of optical microscopy beyond the diffraction limit have been developed [1]

Methods

Results

Conclusion