Abstract
High-resolution grating areas with none stitching error are in demanding needs but usually expensive and hard to prepare. In this paper, we present a method of making refined grating areas from coarse photolithography mask using Displacement Talbot Lithography (DTL). DTL is relatively simple and low-cost system based on mask photolithography for high-resolution periodic structures over large areas. The grating periods on the ordinary coarse photolithography mask was designed as 3.552μm. By patterning gratings on Si3N4 film deposited on fused silica as intervening phase masks, the final prepared grating periods shrinks 8 times, down to 444nm. This technology is suitable for producing large area high resolution gratings to reduce the research cost, and can be applied to applications such as DFB laser production, LED substrates preparation and other relative fields.
Published Version
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