Abstract
High-resolution periodic patterns such as gratings or two-dimensional arrays are required in many applications, especially in photonics devices such as near eye displays (AR/VR), DFB lasers or plasmonic or diffraction based biosensors. Displacement Talbot Lithography (DTL) is a new photolithography technique that enables patterning of large areas with high-resolution periodic structures. DTL offers resolution well below 100nm, which is sufficient even for the most demanding applications that require sub-wavelength resolution such as wire-grid polarizers or anti-reflection surfaces. The new imaging principle of DTL opens new possibilities in the field of photo lithography and its applications.
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