Recent instrumental developments in surface and thin-film analysis by electron and mass spectrometric techniques

Abstract

Recent instrumental and methodical progress with electron and mass spectrometric techniques for practical surface and depth profile analysis is discussed. In particular, work function measurements in a microprobe mode and in conjunction with sputter depth profiling are shown to constitute a useful supplemental method which can be readily incorporated into existing scanning Auger microprobes. The applicability of secondary neutral mass spectrometry SNMS based on electron gas postionization has been expanded by a novel high-frequency mode which enables analysis of dielectric sample structures by low-energy noble-gas ion bombardment with the same conditions as for electrically conducting samples. This new operation mode of SNMS is shown to provide attractive features for high-resolution depth profiling of inhomogeneous conducting samples, too. Finally, the potentialities of secondary neutral microprobes based on laser and electron impact postionization are addressed. A first example for surface imaging with a recently developed prototype of a secondary neutral microprobe based on electron-gas SNMS is given.