Abstract
The effect of oxygen partial pressure on the deposition rate, crystalline structure and optical absorption of thin film titanium suboxides prepared by the reactive sputtering of a titanium metal target is given. A wide variety of films ranging from metallic through semiconducting to dielectric specimens were deposited in a reproducible manner simply by controlling the oxygen content in the sputtering plasma atmosphere. In addition, polycrystalline stable semiconducting TiO 2 electrodes were deposited onto heated glass substrates. The spectral response was investigated; a main absorption edge of about 410 nm was obtained. The design of a special substrate table with a unique mask changer that allowed for the fabrication of different geometrical film patterns is also given.
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