Abstract
Reactive deposition epitaxial growth of β-FeSi2 film on Si(111) has been studied by in situ observation of reflective high energy electron diffraction combined with ex situ Auger electron spectroscopy depth profile analysis. The direct phase formed at the top surface after iron coverage has been determined to be mixture Fe3Si and Fe5Si3, FeSi, and β-FeSi2, respectively, according to the results of different deposit temperature. Diffraction patterns as well as the depth profile for the Fe/Si ratio have been discussed.
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