Abstract
The characteristics of low-frequency noise in n-metal–oxide–semiconductor field-effect transistors with ultranarrow channels have been investigated through random telegraph signals and low-frequency noise spectroscopy. Random telegraph signals with very large amplitude (∼70%) are observed in weak inversion at room temperature. Low-frequency noise spectra having both 1/fn and Lorentzian type are found separately in the same channel at various gate bias voltages. The observations strongly suggest that the low-frequency noise is dominated by carrier mobility fluctuation in weak inversion and by carrier number fluctuation under high-field conditions in an ultranarrow channel.
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