Radiation-enhanced crystallization of amorphous Nb2O5 films according to TEM with in situ video recording

Abstract

Amorphous films are formed on substrates at room temperature in the process of anodic oxidation of niobium foil. The studies were carried out using methods of electron diffraction and “in situ” transmission electron microscopy (TEM) with video recording of structural changes. It was found that electron beam irradiation of the film with a dose rate (4–7)·104 e−/Å2·s inside the column of the electron microscope causes its layer polymorphous crystallization (LPC) with the formation of Nb2O5 crystals with hexagonal lattice. The dimensionless parameter of the relative crystallization length δ0≈ 5000 − 7000. The dependence on time of the crystal diameter is described by a power function with exponents of 1.55, 1.1 and 1.3. According to this the dependence of the fraction of the crystalline phase on time is described by a power function with exponents of 3.1, 2.2 and 2.6. This non-quadratic nature is explained with the formation of a domain superstructure in the low-temperature modification of α-Nb2O5 and phenomenon of polyamorphism in amorphous films.