Abstract
TiO2 thin films were deposited on two different kinds of substrates (α-Al2O3 and LaAlO3) by pulsed laser deposition. The crystal structure and laser-induced voltage (LIV) signal in the films were analyzed through X-ray diffraction and LIV measurements respectively. It was established that the films on the α-Al2O3 substrate were found growing epitaxial to the [100] direction of the rutile structure and remained structure stabilization after intense laser operating, in contrast to the films produced on LaAlO3 were [001] oriented of the anatase phase and had weak structure stability. The magnitude of the LIV signals increases linearly with laser energy density developing in TiO2 thin films, and the films exhibited the best LIV performance of 1.37 V at 0.1 mJ/cm2 with a laser wavelength of 248 nm. The results demonstrate that the TiO2 film deposited on α-Al2O3 is a potential candidate for detecting laser radiations, especially in ultraviolet laser detection.
Published Version
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