Abstract
AFM-based technique of nanolithography is proposed. The method enables rapid point by point indentation with a sharp tip. When used in tandem with single-crystal diamond tips, this technique allows the creation of high aspect ratio grooves in hard materials, such as silicon or metals. Examples of fabricated groove arrays on Si surface with 30–100nm pitches and 5–32nm depths are presented. Cutting of a 63nm thick metal magnetic film is demonstrated. The resulting structure is studied by the use of magnetic force microscopy.
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