Abstract
Pattern profile abnormality on SOG substrate in chemical amplification resist system SAL601-ER7, has been investigated. A resist dissolution rate, strongly related to a generated catalyst concentration, is abnormally enhanced near the SOG substrate. Resist profile simulation suggested that this phenomenon depends on the diffusion effect of a catalyst or its scavenger. According to resist sensitivity variation due to humidity, and FTIR analysis of the SOG, it is considered that H2O in the SOG substrate is the diffusion component acting as the catalyst scavenger.
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